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光催化技术的研究现状和参考文献

时间:2021-01-05 20:40来源:毕业论文
目前对于光催化剂的主要研究方向为如何提高效率,毕竟效率才是第一要素。作为第一代半导体材料光催化剂,通过紫外光激发而生成自由基的光催化剂就研究程度而言已然是属于目前

目前对于光催化剂的主要研究方向为如何提高效率,毕竟效率才是第一要素。作为第一代半导体材料光催化剂,通过紫外光激发而生成自由基的光催化剂就研究程度而言已然是属于目前最成熟的光催化剂了。由于紫外光的波长较短,频率较大,可以激发能带间隙大于3.0eV的半导体(如Ti02, ZnO2, Ga203等)价带上的电子使其发生跃迁而形成光生电子一空穴对。相较于其他长波长的光,紫外光响应型催化剂的选择范围更广,更加节约成本,是目前理论基础最充足,应用范围最广泛的光催化剂。61906

TiO2作为最典型的紫外光响应型催化剂,已被学者们研究了几十年,与此同时,更多的半导体材料也在被研究。本次设计便是已铋基复合材料作为研究对象来研究如何提升其光催化性能。

参考文献

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